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VEECO / EMCORE K465i MOCVD system
GaN
Max temp 1250C degree set point
8 PSU
DRT (bow, real temp) (2) Real temp
8 x MO lines
NH3, SiH4
(2) MO concentration control
(2) Ebara process pump
Laminar flowhood
Automated loading chamber
Nexus control system
H2 + NH3 gas monitor
N2+NH3 POU purifiers
(2) Johson Matthey V-480 H2 Pd cell purifiers
(2) hygrometers
(6) water cooled MO baths
Fully automated metal-organic chemical vapor deposition (MOCVD) system designed for the production of high- brightness light-emitting diodes
Can accommodate up to (45) 2' substrates (or 1x8') in one process
Uses FlowFlange technology designed to create a uniform alkyl and hydride flow across all wafers
Temperature uniformity by (3) separate heating zones controlled by RealTemp200 systems and additional pyrometer
Wafer curvature is monitored by dedicated deflectometer
Fully robotized carrier handling tool allows for continuous operation
2010 vintage.